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Dimensional deposition of copper and silver in conditions of electrochemical micro- and nanomachining

Author: Globa Pavel
Degree:doctor of chemistry
Speciality: 02.00.05 - Electrochemistry
Scientific adviser: Alexandru Dicusar
doctor habilitat, professor, Institute of Applied Physics of the ASM
Institution: Institute of Applied Physics of the ASM
Scientific council: DH 02-02.00.05-27.03.08
Institute of Applied Physics of the ASM


The thesis was presented on the 27 December, 2012
Approved by NCAA on the 21 June, 2013


Adobe PDF document0.32 Mb / in romanian
Adobe PDF document0.64 Mb / in russian


artificial heterogeneity, micro- and macrodistribution, dimensional electrodeposition, template synthesis, the size effect of corrosion, the depth of nanopores filling


The thesis is written in Russian, consists of six chapters (including introduction), general conclusions, recommendations, and a list of references. The work contains 117 pages of text, 54 figure, 4 tables, bibliography, which includes 187 sources.

Publications: the obtained results were published in 27 scientific papers (9 articles, 17 abstracts at conferences and one patent).

Field of research: Electrochemistry.

The aim of the research: was the investigation of chemical and electrochemical deposition of metals from first secondary group (Ag, Cu) in conditions of artificially created heterogeneity of the surface, including the kinetics of the process, the role of macroscopic size effects upon the obtaining of micro- and nanomaterials and the development of electrochemical template synthesis methods that allows to control the size and rate of deposition.

The scientific novelty and originality of the work: based on the study of local microand macrodistribution electrodeposition of copper and silver using thick plastic mask it is shown that, in case of copper and silver electrodeposition mask plays the role of "leveling agent" in a wide range of electrodeposition rates values (iavg / il = 0,1 – 0,75) and the dimensionless thickness of electrodeposited layers (L ~ 0,13 – 0,5); it is shown that the uniformity of the deposited metal layers in the obtaining of porous nanocomposites AIII-BV - metal using copper and silver chemical deposition in nanoporous n - InP is determined by the "depth of penetration” δ; it is established the possibility of predicting the deposition rate of copper and silver during the process of nanomaterials obtaining in the electrochemical template synthesis using galvanostatic deposition; it is found the size effect of the corrosion rate of metal in the electrochemical fabrication of nanomaterials.

The research object is the dimensional chemical and electrochemical deposition of copper and silver in terms of electrochemical micro- and nanomachining using masks, porous materials and membranes.

The theoretical value of the research: it is shown that the uniformity of copper electrodeposition from the standard electrolyte in the presence of micromachining is achieved for the deposited layer thickness that not exceeding one half of the mask thickness and in case of silver deposition from a complex electrolyte the uniformity disappears at a ratio of the thickness of the deposited metal layer to the thickness of the mask ~ 0.15; is developed a method for improving the uniformity of chemical copper and silver deposition in the nanopores of n - InP; is proposed a method of controlling the rate of pulse electrochemical deposition in a template synthesis.

The implementation and practical value of the research: the results of this study shows that a number of observed patterns and based on these methods may be used for other processes of electrochemical deposition (electrochemical template synthesis of bismuth nanowires ensembles using a pulse mode with the removal of dissolved oxygen).